JPH0224848Y2 - - Google Patents
Info
- Publication number
- JPH0224848Y2 JPH0224848Y2 JP1983102959U JP10295983U JPH0224848Y2 JP H0224848 Y2 JPH0224848 Y2 JP H0224848Y2 JP 1983102959 U JP1983102959 U JP 1983102959U JP 10295983 U JP10295983 U JP 10295983U JP H0224848 Y2 JPH0224848 Y2 JP H0224848Y2
- Authority
- JP
- Japan
- Prior art keywords
- wall
- square
- covering material
- fixed
- section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Residential Or Office Buildings (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10295983U JPS6011905U (ja) | 1983-07-01 | 1983-07-01 | 2壁間の接合構造 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10295983U JPS6011905U (ja) | 1983-07-01 | 1983-07-01 | 2壁間の接合構造 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6011905U JPS6011905U (ja) | 1985-01-26 |
JPH0224848Y2 true JPH0224848Y2 (en]) | 1990-07-09 |
Family
ID=30242438
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10295983U Granted JPS6011905U (ja) | 1983-07-01 | 1983-07-01 | 2壁間の接合構造 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6011905U (en]) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6873087B1 (en) | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
US6916584B2 (en) | 2002-08-01 | 2005-07-12 | Molecular Imprints, Inc. | Alignment methods for imprint lithography |
US6921615B2 (en) | 2000-07-16 | 2005-07-26 | Board Of Regents, The University Of Texas System | High-resolution overlay alignment methods for imprint lithography |
US6954275B2 (en) | 2000-08-01 | 2005-10-11 | Boards Of Regents, The University Of Texas System | Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography |
US6990870B2 (en) | 2002-12-12 | 2006-01-31 | Molecular Imprints, Inc. | System for determining characteristics of substrates employing fluid geometries |
US7071088B2 (en) | 2002-08-23 | 2006-07-04 | Molecular Imprints, Inc. | Method for fabricating bulbous-shaped vias |
US7122079B2 (en) | 2004-02-27 | 2006-10-17 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
US7136150B2 (en) | 2003-09-25 | 2006-11-14 | Molecular Imprints, Inc. | Imprint lithography template having opaque alignment marks |
US7157036B2 (en) | 2003-06-17 | 2007-01-02 | Molecular Imprints, Inc | Method to reduce adhesion between a conformable region and a pattern of a mold |
US7452574B2 (en) | 2003-02-27 | 2008-11-18 | Molecular Imprints, Inc. | Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer |
US9223202B2 (en) | 2000-07-17 | 2015-12-29 | Board Of Regents, The University Of Texas System | Method of automatic fluid dispensing for imprint lithography processes |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62171582U (en]) * | 1986-04-18 | 1987-10-30 | ||
JP6781002B2 (ja) * | 2016-09-29 | 2020-11-04 | 三協立山株式会社 | 独立構造体 |
JP6781003B2 (ja) * | 2016-09-29 | 2020-11-04 | 三協立山株式会社 | 独立構造体 |
JP7301735B2 (ja) * | 2019-12-27 | 2023-07-03 | Ykk Ap株式会社 | 屋外構築物 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5839948U (ja) * | 1981-09-11 | 1983-03-16 | 新日軽株式会社 | 張出し付属室 |
-
1983
- 1983-07-01 JP JP10295983U patent/JPS6011905U/ja active Granted
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6873087B1 (en) | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
US6921615B2 (en) | 2000-07-16 | 2005-07-26 | Board Of Regents, The University Of Texas System | High-resolution overlay alignment methods for imprint lithography |
US9223202B2 (en) | 2000-07-17 | 2015-12-29 | Board Of Regents, The University Of Texas System | Method of automatic fluid dispensing for imprint lithography processes |
US6954275B2 (en) | 2000-08-01 | 2005-10-11 | Boards Of Regents, The University Of Texas System | Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography |
US6916584B2 (en) | 2002-08-01 | 2005-07-12 | Molecular Imprints, Inc. | Alignment methods for imprint lithography |
US7071088B2 (en) | 2002-08-23 | 2006-07-04 | Molecular Imprints, Inc. | Method for fabricating bulbous-shaped vias |
US6990870B2 (en) | 2002-12-12 | 2006-01-31 | Molecular Imprints, Inc. | System for determining characteristics of substrates employing fluid geometries |
US7452574B2 (en) | 2003-02-27 | 2008-11-18 | Molecular Imprints, Inc. | Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer |
US7157036B2 (en) | 2003-06-17 | 2007-01-02 | Molecular Imprints, Inc | Method to reduce adhesion between a conformable region and a pattern of a mold |
US7136150B2 (en) | 2003-09-25 | 2006-11-14 | Molecular Imprints, Inc. | Imprint lithography template having opaque alignment marks |
US7122079B2 (en) | 2004-02-27 | 2006-10-17 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
Also Published As
Publication number | Publication date |
---|---|
JPS6011905U (ja) | 1985-01-26 |
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